Global Pellicle Market Growth 2025-2031

The global Pellicle market size is predicted to grow from US$ 931 million in 2025 to US$ 1484 million in 2031; it is expected to grow at a CAGR of 8.1% from 2025 to 2031.

The pellicle is a part of the photomask. As a covering, the pellicle is suspended above the photomask to form a physical barrier. Even if particles fall on it, they will not touch the mask itself. The pellicle can effectively prevent mask contamination and plays a vital role in improving production efficiency and chip quality.

A pellicle is a thin membrane stretched over an aluminum frame and glued to the photomask to protect it from contaminants, such as particles. Even if particles sit on the membrane, they are not printed on the wafer/ flat panel displays because they are out of focus during the exposure from the lithography process.

The process of preparing this Pellicle is also full of scientific and technological content. Usually, precise vacuum coating technology such as physical vapor deposition (PVD) or chemical vapor deposition (CVD) is used to form a uniform and dense film on the surface of the mask. This process requires precise control of parameters such as temperature, pressure and gas flow to ensure the quality and performance of the film.

Global key Pellicle players cover Mitsui Chemicals, Shin-Etsu, FINE SEMITECH, Micro Lithography, Inc., S&S Tech and INKO, etc. In terms of revenue, the global 3 largest companies occupied for a share nearly 85.67% in 2023.

From the perspective of downstream fields, the semiconductor field occupies a dominant position, accounting for about 74.17% in 2023. In semiconductor manufacturing, the role of this Pellicle is far more than simple physical protection. It can also effectively reduce the diffraction effect in the lithography process and improve the imaging quality. Especially in extreme ultraviolet lithography (EUVL) technology, due to the extremely short wavelength of the light source (about 13.5nm), the traditional penetrating mask can no longer be used. At this time, the reflective mask and its Pellicle have become the key technology.

It is worth noting that with the continuous advancement of chip manufacturing technology, the requirements for the mask Pellicle are getting higher and higher. For example, in advanced processes of 7nm and below, the size of the pattern on the mask may be only tens of nanometers, which puts extremely stringent requirements on the uniformity and defect control of the Pellicle.

Globally, Asia (especially China, Taiwan, and South Korea) dominates the mask protective film market. China is playing an increasingly important role in the world. As China develops in the field of semiconductor manufacturing, the demand for mask protective films in the region is also increasing.

1. Segmentation by Type:
   • Pellicle for Quartz Mask
   • Pellicle for Soda Mask
2. Segmentation by Application:
   • Semiconductor
   • FPD
   • Others
3. Market by Region:
   • Americas
   • APAC
   • Europe
   • Middle East & Africa
4. Company's Coverage:
   • MITSUI Chemical
   • FINE SEMITECH
   • NEPCO
   • Shin-Etsu
   • INKO
   • S&S Tech
   • Canatu
   • Micro Lithography Inc (MLI)

Key Questions Addressed in this Report:

• What is the 10-year outlook for the global Pellicle market?
• What factors are driving Pellicle market growth, globally and by region?
• Which technologies are poised for the fastest growth by market and region?
• How do Pellicle market opportunities vary by end market size?
• How does Pellicle break out by Type, by Application?